China Builds First EUV Chipmaking Prototype, Challenging Global Semiconductor Control

China has reached a major technology milestone. The country has reportedly developed its first domestic extreme ultraviolet system. This China EUV chip breakthrough could reshape the global semiconductor race. EUV lithography allows manufacturers to produce the world’s most advanced chips. Until now, only Dutch company ASML mastered this technology. However, China’s progress shows rapid advances despite strict global restrictions.
For years, the United States limited China’s access to EUV tools. As a result, Chinese firms focused on developing alternatives at home. Recent reports suggest those efforts are now paying off.

Why EUV Technology Matters

EUV systems enable chipmakers to produce smaller and more powerful processors. These chips power smartphones, data centers, and artificial intelligence systems. Therefore, control over EUV technology offers huge strategic advantages.
According to reports, companies like SMIC played a key role in this effort. Engineers reportedly studied older ASML components to understand system design. In addition, domestic research teams adapted those lessons into a working prototype.
Reuters noted that experts did not expect such rapid progress. Earlier this year, ASML’s CEO said China was still many years away. However, this prototype suggests timelines may be shifting faster than expected.
The prototype does not yet match commercial EUV machines. Still, it represents a major technical step forward. As a result, China could reduce its reliance on foreign suppliers over time.
Industry analysts believe further testing and refinement will follow. If successful, local chip production could reach new levels. That would strengthen supply chain independence and technological resilience.
Overall, this development highlights China’s determination to overcome barriers. The semiconductor industry may now face a more competitive and divided future.